Aller au menu Aller au contenu
Innover pour un avenir durable

Institut polytechnique de Grenoble

Grenoble Institute of Engineering
Innover pour un avenir durable
Innover pour un avenir durable

> L'Institut > Actualités

Séminaire du professeur Man Wong, invité au laboratoire TIMA

Publié le 14 janvier 2016
A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo
Colloque / Séminaire 20 janvier 2016

Le professeur invité du laboratoire TIMA, Man Wong donnera un séminaire le 20 janvier à 14h au CIME à Minatec.

Conférence,-réunion-©-kasto---Fotolia-66825250.jpg

Conférence,-réunion-©-kasto---Fotolia-66825250.jpg



An Indium-Galium-Zinc Oxide Thin-Film Transistor with Annealing-Induced Homojunctions


 

Abstract :
The resistivity of an indium-gallium-zinc oxide (IGZO) thin film was found to depend on not only the conditions of its thermal annealing but also the oxygen-permeability of the cover film during the heat-treatment.
Based on this observation, a technology for constructing a homojunction IGZO thin-film transistor (TFT) has been developed and demonstrated.
In this device architecture, the junction and channel regions were capped respectively by impermeable and permeable covers.
During a subsequent junction “activation” heat-treatment in an oxidizing atmosphere, the resistivity of the source and drain regions were greatly reduced; while the channel region, being exposed to the oxidizing atmosphere through the permeable cover, retained its highly resistive character.
The permeable cover could serve additionally as an etch-stop during the removal of the impermeable cover over the channel region, thus preventing the region from being exposed to the etch.


Biography

Man Wong was born in Beijing, China. From 1979 to 1984, he studied at the Massachusetts Institute of Technology, USA, where he obtained his BS and MS degrees in Electrical Engineering. From 1985 to 1988, he was at the Center for Integrated Systems at Stanford University, USA, where he worked on tungsten-gate MOS technology and obtained his PhD degree, also in Electrical Engineering. From 1988 to 1992, he was with the Semiconductor Process and Design Center of Texas Instruments, USA and worked on the modeling and development of integrated-circuit metallization systems and dry/vapor surface-conditioning processes. He is currently with the Department of Electronic and Computer Engineering at the Hong Kong University of Science and Technology, Hong Kong. His research interests include micro-fabrication technology, device structure and material; physics and technology of thin-film transistor; organic light-emitting diode display technology; modeling and implementation of integrated micro-systems; and thin-film solar cell device and process technology. He is a member of Tau Beta Pi, Eta Kappa Nu and Sigma Xi. He was appointed an Honorary Guest Professor of Nankai University, Tianjin, China, in 2003; a Visiting Professor of Soochow University, Suzhou, China, in 2011; a Distinguished Visiting Professor of the State Key Laboratory of Transducers Technology at the Institute of Microsystems and Information Technology of the Chinese Academy of Sciences, Shanghai, China, in 2015; and a Visiting Professor of Xiangtang University, Xiangtang, China, in 2015


   MINATEC - CIME Nanotech - Room A342 (2nd floor)
A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo

mise à jour le 18 janvier 2016

A
Minatec Minatec
3 parvis Louis Neel
38054 Grenoble
En savoir +
Univ. Grenoble Alpes