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Institut polytechnique de Grenoble

Grenoble Institute of Engineering
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Introduction to Nano Electronics Devices and Circuits

Field of study: Nanotechnologies

Level: Bachelor

Detailed prerequisites: Basics of semiconductor materials

Objective of the course/learning outcomes: These lectures will review the basics physics and technology of CMOS transistors and circuits for logic application. The operation of Metal Oxyde Semiconductor transistors at the Nanoscale will be discussed, underlying recent progresses in this area. Several technological aspects (processes) will be presented. Finally, an original and emerging technology (Silicon On Insulator) will be introduced in more details.

Lecture content:
- Short Introduction to SC and SC technologies (first course)
- Cold Plasma for SC; PECVD and etching (second and third course)
- Examples of new processes and flow chart (fourth and fifth course)
  • Metal gate first vs metal gate last, FDSOI and FinFet
  • Damascene and dual damascene plasma etching
  • HDP-CVD and ALD for gap filling and conformality
  • ALD for patterning: double and quadruple patterning
- Examples of scaling by materials: low k, high k (last course)

Lecture/contact hours: 7.5 hours

Teaching language: English

Detailed examination modalities: written exam

Instructor: Prof. Christophe Vallée
Department: Université de Grenoble / Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
e-mail :

Date of update December 7, 2018

Univ. Grenoble Alpes